Specific Process Knowledge/Thin film deposition/ALD2 (PEALD): Difference between revisions
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The ALD depositions take place under vacuum, thus a vacuum pump is connected to the bottom of the ALD reactor. The pump is located in the basement. | The ALD depositions take place under vacuum, thus a vacuum pump is connected to the bottom of the ALD reactor. The pump is located in the basement. | ||
Different precursors are connected to the reactor chamber through separate gas lines. At the moment the available precursors are TMA, TiCl<sub>4</sub>, SAM24, TEMAHf, H<sub>2</sub> | Different precursors are connected to the reactor chamber through separate gas lines. At the moment the available precursors are TMA, TiCl<sub>4</sub>, SAM24, TEMAHf, H<sub>2</sub>O and NH<sub>3</sub>, and soon O<sub>3</sub> will also be available. These gas lines are all purged with a constant flow of nitrogen. | ||
The precursor sources TMA, TiCl<sub>4</sub> and H<sub>2</sub> | The precursor sources TMA, TiCl<sub>4</sub> and H<sub>2</sub>O are located in a side cabinet on the left side of the machine. When these precursors are not in use, the manual valves have to be closed. The precursors SAM24 and TEMAHf are located in the big cabinet below the ALD chamber. These precursors are heated by a heating jacked, and users should not close the manual valves. O<sub>2</sub> is generated by use of an ozone generator that is located in the E-rack at the right side of the machine. | ||
A remote plasma generator is connected to the upper part of the reactor chamber. Different precursor gasses are connected to this plasma generator through the same gas inlet. At the moment the available plasma precursor gasses are N<sub>2</sub>, O<sub>2</sub> and NH<sub>3</sub>. The plasma gas inlet is constantly purged with argon. The plasma gasses can also be used as normal precursors if the power to the plasma generator is not turned on. | A remote plasma generator is connected to the upper part of the reactor chamber. Different precursor gasses are connected to this plasma generator through the same gas inlet. At the moment the available plasma precursor gasses are N<sub>2</sub>, O<sub>2</sub> and NH<sub>3</sub>. The plasma gas inlet is constantly purged with argon. The plasma gasses can also be used as normal precursors if the power to the plasma generator is not turned on. | ||