Specific Process Knowledge/Thin film deposition/Furnace LPCVD TEOS: Difference between revisions
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==Process Knowledge== | ==Process Knowledge== | ||
Please take a look at the process side for deposition of | Please take a look at the process side for deposition of TEOS oxide: | ||
[[Specific Process Knowledge/Thin film deposition/Deposition of Silicon Nitride/Deposition of Silicon Nitride using LPCVD|Deposition of Silicon Nitride using LPCVD]] | [[Specific Process Knowledge/Thin film deposition/Deposition of Silicon Nitride/Deposition of Silicon Nitride using LPCVD|Deposition of Silicon Nitride using LPCVD]] | ||
<br clear="all" /> | <br clear="all" /> | ||
==A rough overview of the performance of LPCVD Silicon Nitride and some process related parameters== | ==A rough overview of the performance of LPCVD Silicon Nitride and some process related parameters== | ||