Specific Process Knowledge/Etch/DRIE-Pegasus/processA: Difference between revisions
| Line 397: | Line 397: | ||
| 2000 <!-- coil power --> | | 2000 <!-- coil power --> | ||
| 7.0 <!-- etch time --> | | 7.0 <!-- etch time --> | ||
| 150 <!-- etch pressure | | 25(1.5s) 150 <!-- etch pressure --> | ||
| 350(1.5s) 550 <!-- SF6 flow --> | | 350(1.5s) 550 <!-- SF6 flow --> | ||
| 5 <!-- O2 flow --> | | 5 <!-- O2 flow --> | ||