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Specific Process Knowledge/Etch/DRIE-Pegasus/processA: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,569 edits
Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,569 edits
Line 370: Line 370:
{| border="1" cellpadding="1" cellspacing="0" style="text-align:center;"
{| border="1" cellpadding="1" cellspacing="0" style="text-align:center;"
|-
|-
! rowspan="2" width="20"| Name
! rowspan="2" width="20"| Recipe
! rowspan="2" width="20"| Temp.
! rowspan="2" width="20"| Temp.
! colspan="6" | Deposition step
! colspan="4" | Deposition step
! colspan="7" | Etch step
! colspan="7" | Etch step
! colspan="3" | Comments
! colspan="3" | Comments
Line 379: Line 379:
! Pres.
! Pres.
! C<sub>4</sub>F<sub>8</sub>
! C<sub>4</sub>F<sub>8</sub>
! SF<sub>6</sub>
! O<sub>2</sub>
! Coil  
! Coil  
! Time
! Time
! Pres.
! Pres.
! C<sub>4</sub>F<sub>8</sub>
! SF<sub>6</sub>
! SF<sub>6</sub>
! O<sub>2</sub>
! O<sub>2</sub>
Line 393: Line 390:
! width="100" | Key words
! width="100" | Key words
|-
|-
! Step1 11 cyc <!-- step -->
! PrA-0 <!-- step -->
| rowspan="2" |20      <!-- chiller temp -->
| 20      <!-- chiller temp -->
! 4      <!-- dep time -->
! 4      <!-- dep time -->
| 25      <!-- dep pressure -->
| 25      <!-- dep pressure -->
| 200      <!-- C4F8 flow -->
| 200      <!-- C4F8 flow -->
| 0      <!-- SF6 flow -->
| 0    <!-- O2 flow -->
| 2000      <!-- coil power -->
| 2000      <!-- coil power -->
| 7.0      <!-- etch time -->
| 7.0      <!-- etch time -->
| 25(1.5s) 90>>150      <!-- etch pressure -->
| 150      <!-- etch pressure -->
| 0      <!-- C4F8 flow -->
| 0      <!-- C4F8 flow -->
| 350(1.5s) 550      <!-- SF6 flow -->
| 350(1.5s) 550      <!-- SF6 flow -->
| 5      <!-- O2 flow -->
| 5      <!-- O2 flow -->
| 2800      <!-- coil power -->
| 2800      <!-- coil power -->
| 120>>140(1.5s) 45      <!-- platen power -->
| 140(1.5s) 45      <!-- platen power -->
! rowspan="2" | Old      <!-- Showerhead -->
! rowspan="2" | Old      <!-- Showerhead -->
| rowspan="2" |[[Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/ProcessA | 1]]      <!-- link processes -->
| rowspan="2" |[[Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/ProcessA | 1]]      <!-- link processes -->
| rowspan="2" |    <!-- keywords -->
| rowspan="2" |    <!-- keywords -->
|-
! Step2 44 cyc <!-- step -->
! 4      <!-- dep time -->
| 25      <!-- dep pressure -->
| 200      <!-- C4F8 flow -->
| 0      <!-- SF6 flow -->
| 0    <!-- O2 flow -->
| 2000      <!-- coil power -->
| 7.0      <!-- etch time -->
| 25(1.5s) 150      <!-- etch pressure -->
| 0      <!-- C4F8 flow -->
| 350(1.5s) 550      <!-- SF6 flow -->
| 5      <!-- O2 flow -->
| 2800      <!-- coil power -->
| 140(1.5s) 45      <!-- platen power -->
|-
! Step1 11 cyc <!-- step -->
| rowspan="2" |20      <!-- chiller temp -->
! 4      <!-- dep time -->
| 25      <!-- dep pressure -->
| 200      <!-- C4F8 flow -->
| 0      <!-- SF6 flow -->
| 0    <!-- O2 flow -->
| 2000      <!-- coil power -->
| 7.0      <!-- etch time -->
| 25(1.5s) 90>>150      <!-- etch pressure -->
| 0      <!-- C4F8 flow -->
| 350(1.5s) 550      <!-- SF6 flow -->
| 5      <!-- O2 flow -->
| 2800      <!-- coil power -->
| 120>>140(1.5s) 45      <!-- platen power -->
! rowspan="2" | New      <!-- Showerhead -->
| rowspan="2" |[[Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/ProcessA | 1]]      <!-- link processes -->
| rowspan="2" | Profile improved  <!-- keywords -->
|-
! Step2 44 cyc <!-- step -->
! 4      <!-- dep time -->
| 25      <!-- dep pressure -->
| 200      <!-- C4F8 flow -->
| 0      <!-- SF6 flow -->
| 0    <!-- O2 flow -->
| 2000      <!-- coil power -->
| 7.0      <!-- etch time -->
| 25(1.5s) 150      <!-- etch pressure -->
| 0      <!-- C4F8 flow -->
| 350(1.5s) 550      <!-- SF6 flow -->
| 5      <!-- O2 flow -->
| 2800      <!-- coil power -->
| 140(1.5s) 45      <!-- platen power -->
|-
|-
|}
|}
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