Specific Process Knowledge/Thin film deposition/ALD Picosun R200/ALD multilayers: Difference between revisions
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Recipe: EMA04 | Recipe: EMA04 | ||
Temperature: 120 <sup>o</sup>C | <b>Temperature: 120 <sup>o</sup>C</b> | ||
<gallery caption="" widths="500px" heights="500px" perrow="2"> | |||
image:Al2O3_TiO2_flat_multilayers.JPG| Al<sub>2</sub>O<sub>3</sub>/TiO<sub>2</sub> multilayers grown on silicon trenches. | |||
</gallery> | |||
==Al<sub>2</sub>O<sub>3</sub>/TiO<sub>2</sub> multilayers on high aspect ratio structures== | ==Al<sub>2</sub>O<sub>3</sub>/TiO<sub>2</sub> multilayers on high aspect ratio structures== | ||