Specific Process Knowledge/Etch/Wet III-V Etches: Difference between revisions
Appearance
No edit summary |
|||
| Line 9: | Line 9: | ||
<br> | <br> | ||
For dry etching III-V materials see | |||
*[[Specific Process Knowledge/Etch/III-V ICP|III-V ICP]] | |||
*[[Specific Process Knowledge/Etch/III-V RIE|III-V RIE - Plassys]] | |||
== InP or GaAs substrate etching == | == InP or GaAs substrate etching == | ||