Jump to content

Specific Process Knowledge/Pattern Design: Difference between revisions

← Older editNewer edit →
VisualWikitext
Kabi (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
1,146 edits
No edit summary
Kabi (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
1,146 edits
Line 35: Line 35:


* For '''DUV-lithography''' and DUV-lithography it is necescary to have physical masks (reticles) produced based on the layout file. The file format has to be GDS. For more details concerning the design of reticle see [[Specific_Process_Knowledge/Lithography/DUVStepperLithography#Process_information|Design of Reticles]].
* For '''DUV-lithography''' and DUV-lithography it is necescary to have physical masks (reticles) produced based on the layout file. The file format has to be GDS. For more details concerning the design of reticle see [[Specific_Process_Knowledge/Lithography/DUVStepperLithography#Process_information|Design of Reticles]].
=== Tips and tricks for mask designing ===
You can find a
* [[Media:Beginner_guide_to_mask_design_using_Clewin_v1.1.pdf‎|"Beginners guide to mask design"  here]] and
* [[Media:Guide to mask making.pdf | Guide to mask making.pdf]]. Unfortunately this is quite old, but may be useful anyway. Note some links/e-mails etc. are not correct anymore


===Mask drawing with Matlab and AutoCAD===
===Mask drawing with Matlab and AutoCAD===
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Pattern_Design"