Specific Process Knowledge/Pattern Design: Difference between revisions
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* For '''UV-lithography''' it is necescary to have a physical masks produced based on the layout file. The file format has to be CIF or GDS. | * For '''UV-lithography''' it is necescary to have a physical masks produced based on the layout file. The file format has to be CIF or GDS. | ||
* For '''DUV-lithography''' and DUV-lithography it is necescary to have physical masks (reticles) produced based on the layout file. The file format has to be GDS. For more details concerning the design of reticle see [[Specific_Process_Knowledge/Lithography/DUVStepperLithography| | * For '''DUV-lithography''' and DUV-lithography it is necescary to have physical masks (reticles) produced based on the layout file. The file format has to be GDS. For more details concerning the design of reticle see [[Specific_Process_Knowledge/Lithography/DUVStepperLithography#Process_information|Design of Reticles]]. | ||
=== Tips and tricks for mask designing === | === Tips and tricks for mask designing === | ||