Specific Process Knowledge/Pattern Design: Difference between revisions
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To come soon | To come soon | ||
== Mask Fabrication == | == Mask Fabrication for UV-lithography == | ||
=== How to order a mask=== | === How to order a mask=== | ||
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The smallest feature size obtainable from Delta Mask is 1.5 µm. If you need structures smaller than this please write it specificly in the e-mail. Be aware that this will increase the price by at least a factor of 3. | The smallest feature size obtainable from Delta Mask is 1.5 µm. If you need structures smaller than this please write it specificly in the e-mail. Be aware that this will increase the price by at least a factor of 3. | ||
Send your *.cif file or *.gds file (for 7" mask or masks with CD | Send your *.cif file or *.gds file (for 7" mask or masks with CD less than 1.5µm only *.gds should be used) in an e-mail along with a text file describing your specs ([[mask_spec|example spec file]]). | ||
If you are using L-edit to design your mask you should remember to mark the top cell as the fabrication cell (a small red <b style="color:red">''f''</b> should show to the left of the cell name in the Design Navigator. | If you are using L-edit to design your mask you should remember to mark the top cell as the fabrication cell (a small red <b style="color:red">''f''</b> should show to the left of the cell name in the Design Navigator. | ||
Remember to make only the layers for fabrication visible. The remaining should be invisible. | |||
Give each layer appropriate GDS number respectively CIF names before exporting the file. This is done by double click on the layers and fill out the window that pops up. | |||
E-mail address can be found in [[Danchip_contact_information]]. | E-mail address can be found in [[Danchip_contact_information]]. | ||