Specific Process Knowledge/Pattern Design: Difference between revisions
Appearance
| Line 26: | Line 26: | ||
If you have a Mac or Linux computer look [[/CleWin#Working with a Mac or Linux computer |here]]. | If you have a Mac or Linux computer look [[/CleWin#Working with a Mac or Linux computer |here]]. | ||
=== Layout file format=== | |||
For E-beam lithography the layout file has to be saved as a GDS file that is uploaded to the equipment computer. | For E-beam lithography the layout file has to be saved as a GDS file that is uploaded to the equipment computer. | ||