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Specific Process Knowledge/Thermal Process/Dope with Phosphorus: Difference between revisions

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Kabi (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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One wafer from Jan2015 was analyzed with SIMS and the profile is shown on the graph below:
One wafer from Jan2015 was analyzed with SIMS and the profile is shown on the graph below:


[[image:Phosphorus_doping2015.jpg|600x600px|left|thumb|SIMS Measurement After Predeposition, before and after oxidation respectively]]
[[image:Phosphorus_doping2015.jpg|500x600px|left|thumb|SIMS Measurement After Predeposition, before and after oxidation respectively]]


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[[image:Phosphorous_doping_profile.jpg|600x600px|left|thumb|SIMS Measurement after Phosphorous Predeposition and several oxidations and annealings]]
[[image:Phosphorous_doping_profile.jpg|500x600px|left|thumb|SIMS Measurement after Phosphorous Predeposition and several oxidations and annealings]]


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