Specific Process Knowledge/Thin film deposition/Lesker: Difference between revisions
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====Thickness uniformity==== | ====Thickness uniformity==== | ||
We have measured the thickness of a TiO<sub>x</sub> film deposited on a 6" | We have measured the thickness of a TiO<sub>x</sub> film deposited on a 6" Si wafer. The thickness measurement was done in the VASE ellipsometer. | ||
[[File:TiO2_150mm_13_points_from_lesker_20151103.png|500px|right]] | [[File:TiO2_150mm_13_points_from_lesker_20151103.png|500px|right]] | ||