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Specific Process Knowledge/Lithography/PMMA: Difference between revisions

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{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;" width="90%"
 
{|border="1" cellspacing="1" cellpadding="3" style="text-align:left;" width="95%"
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|-
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|-style="background:Black; color:White"
|-style="background:silver; color:black"
|'''Resist'''
|'''Resist'''
|'''Polarity'''
|'''Polarity'''
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|'''Technical reports'''
|'''Technical reports'''
|'''Spinner'''
|'''Spinner'''
|'''Thinner'''
|'''Developer'''
|'''Developer'''
|'''Rinse'''
|'''Rinse'''
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|-style="background:White; color:black"
|-style="background:WhiteSmoke; color:black"
|'''[[Specific_Process_Knowledge/Lithography/CSAR|CSAR]]'''
|'''[[Specific_Process_Knowledge/Lithography/PMMA|PMMA]]'''
|Positive
|Positive
|[http://www.allresist.com AllResist]
| [http://www.allresist.com AllResist]
|Standard positive resist, very similar to ZEP520.
|We have various types of PMMA in the cleanroom. Please contact [mailto:Lithography@danchip.dtu.dk Lithography] for information.
|[[media:Allresist_CSAR62_English.pdf‎|Allresist_CSAR62_English.pdf‎]],, [[media:CSAR_62_Abstract_Allresist.pdf‎|CSAR_62_Abstract_Allresist.pdf‎]]
|
|[[Specific_Process_Knowledge/Lithography/Coaters#Manual Spinner 1|Manual Spinner 1 (Laurell)]], [[Specific_Process_Knowledge/Lithography/Coaters#Spin_coater:_Manual_Labspin|Spin Coater Labspin]]
|See table <u>[[Specific_Process_Knowledge/Lithography/Coaters#Coaters:_Comparison_Table|here]] </u>
|XAR-600-546, XAR-600-548, N50, MIBK:IPA
|Anisole
|MIBK:IPA (1:3), IPA:H2O
|IPA
|IPA
|AR-600-71, 1165 Remover
|acetone/1165
|[[media:Process_Flow_CSAR.docx‎|Process Flow CSAR.docx‎]]
|
|}




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