Specific Process Knowledge/Thermal Process/A3 Phosphor Drive-in furnace: Difference between revisions
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[[Image:image.JPG|thumb|300x300px|A3 phosphorus drive-in furnace: positioned in cleanroom 2]] | [[Image:image.JPG|thumb|300x300px|A3 phosphorus drive-in furnace: positioned in cleanroom 2]] | ||
A3 Furnace phosphorus drive-in is a Tempress horizontal furnace for oxidation of silicon wafers, annealing and for drive-in of | A3 Furnace phosphorus drive-in is a Tempress horizontal furnace for oxidation of silicon wafers, annealing and for drive-in of phosphor after a pre-deposition of phospher in the A4 Furnace phosphorus pre-dep. It can also be used for drive in of phosphor which has been ion implanted. | ||
This furnace is the third furnace tube in the furnace A-stack positioned in cleanroom 2. The A-stack together with furnace C1 are the cleanest of all our furnaces. Please be aware of which substrates are allowed to enter this furnace. Check the cross contamination chart. If you are in doubt, please ask one from the furnace team. | This furnace is the third furnace tube in the furnace A-stack positioned in cleanroom 2. The A-stack together with furnace C1 are the cleanest of all our furnaces. Please be aware of which substrates are allowed to enter this furnace. Check the cross contamination chart. If you are in doubt, please ask one from the furnace team. | ||
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!style="background:silver; color:black;" align="left"|Purpose | !style="background:silver; color:black;" align="left"|Purpose | ||
|style="background:LightGrey; color:black"|Drive-in of | |style="background:LightGrey; color:black"|Drive-in of phosphor, oxidation and annealing ||style="background:WhiteSmoke; color:black"|Oxidation: | ||
*Dry | *Dry | ||
*Wet: with torch (H2+O2) | *Wet: with torch (H2+O2) | ||