Specific Process Knowledge/Thin film deposition/Deposition of Titanium Oxide: Difference between revisions
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* E-beam evaporation of TiO2 | * E-beam evaporation of TiO2 | ||
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*ALD (atomic layer deposition of TiO<sub>2</sub> | *ALD (atomic layer deposition) of TiO<sub>2</sub> | ||
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*Not Known | *Not Known | ||
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*Very good. Covers sample everywhere (but long purge time needed | *Very good. Covers sample everywhere (but long purge time needed for very high aspect ratio structures) | ||
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*[[Specific Process Knowledge/Thin film deposition/ALD Picosun R200/TiO2 deposition using ALD|TiO2 deposition using ALD]] | *[[Specific Process Knowledge/Thin film deposition/ALD Picosun R200/TiO2 deposition using ALD|TiO2 deposition using ALD]] | ||
*[[Specific Process Knowledge/Thin film deposition/ALD Picosun R200/TiO2 deposition using ALD/TiO2 deposition on trenches using ALD|TiO2 deposition on trenches using ALD]] | |||
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