Specific Process Knowledge/Lithography/UVExposure: Difference between revisions
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|style="background:LightGrey; color:black"|Minimum structure size | |style="background:LightGrey; color:black"|Minimum structure size | ||
|style="background:WhiteSmoke; color:black" align="center" colspan="2"| | |style="background:WhiteSmoke; color:black" align="center" colspan="2"| | ||
down to 0. | down to 0.8 µm <sup>1)</sup> | ||
|- | |- | ||
|style="background:LightGrey; color:black"|Mask size | |style="background:LightGrey; color:black"|Mask size | ||