Specific Process Knowledge/Lithography/Coaters/Spin Coater: RCD8 processing: Difference between revisions
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*'''1 DCH MiR 701 man disp 2um''' <sup>1)</sup> | *'''1 DCH MiR 701 man disp 2um''' <sup>1)</sup> | ||
Spin-off: 30 s at 2350 rpm. | Spin-off: 30 s at 2350 rpm. | ||
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;" | {|border="1" cellspacing="0" cellpadding="3" style="text-align:left;" | ||
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|} | |} | ||
<sup>1)</sup> Not implemented yet. | |||
<br clear="all" /> | <br clear="all" /> | ||