Specific Process Knowledge/Lithography/Coaters/Spin Coater: RCD8 processing: Difference between revisions
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[[Image:RCD8 SU-8 2075.jpg|300x300px|thumb|right|Spin curve for SU-8 2075]] | [[Image:RCD8 SU-8 2075.jpg|300x300px|thumb|right|Spin curve for SU-8 2075]] | ||
[[Image:RCD8 SU-8 2075 Gyrset.jpg|300x300px|thumb|right|Spin curve for SU-8 2075 using Gyrset]] | [[Image:RCD8 SU-8 2075 Gyrset.jpg|300x300px|thumb|right|Spin curve for SU-8 2075 using Gyrset]] | ||
Spin coating of SU-8 2075 on Spin Coater: RCD8 using automatic dispense | Spin coating of SU-8 2075 on Spin Coater: RCD8 using automatic dispense | ||
Dispense; SU-8 string breaking; spread step; spin-off; deceleration. | |||
''Recipe names, process parameters, and test results:'' | ''Recipe names, process parameters, and test results:'' | ||