Specific Process Knowledge/Lithography/Development: Difference between revisions
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'''The user manual, user APV, and contact information can be found in [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=154 LabManager]''' | '''The user manual, user APV, and contact information can be found in [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=154 LabManager]''' | ||
Development time is strongly dependent on the SU-8 thickness. Here are some suggestions: | |||
*2-5µm: 2 min. in "first"; 2 min. in "final" | |||
*40µm: 5 min. in "first"; 5 min. in "final" | |||
*180-250µm: 15 min. in "first"; 15 min. in "final" | |||
=== Equipment performance and process related parameters === | === Equipment performance and process related parameters === | ||