Specific Process Knowledge/Lithography/UVExposure: Difference between revisions
| Line 161: | Line 161: | ||
The Aligner: MA6 - 2 has an i-line notch filter installed. This results in an exposure light peak at 365nm. Compared to exposure on the KS Aligner, the optimal dose should be very similar. Dependent on the spectral sensitivity of the resist, the optimal dose may be increased compared to broadband exposure on the Aligner-6inch. | The Aligner: MA6 - 2 has an i-line notch filter installed. This results in an exposure light peak at 365nm. Compared to exposure on the KS Aligner, the optimal dose should be very similar. Dependent on the spectral sensitivity of the resist, the optimal dose may be increased compared to broadband exposure on the Aligner-6inch. | ||
The 500W | The 500W Hg-Xe lamp also enables exposure in the DUV range around 240nm. This functionality is not established yet, partly due to safety concerns. | ||
*[[Specific Process Knowledge/Lithography/UVExposure_Dose|Information on UV exposure dose]] | *[[Specific Process Knowledge/Lithography/UVExposure_Dose|Information on UV exposure dose]] | ||