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Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300: Difference between revisions

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Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,318 edits
Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,318 edits
Line 79: Line 79:
*O<sub>2</sub>: 0-100 sccm
*O<sub>2</sub>: 0-100 sccm
*CHF<sub>3</sub>: 0-100 sccm
*CHF<sub>3</sub>: 0-100 sccm
*Cl<sub>2</sub>: 0-30 sccm
*N<sub>2</sub>: 0-1000 sccm
*N<sub>2</sub>: 0-1000 sccm
Deposition source:
Deposition source:
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