Specific Process Knowledge/Lithography/Coaters/Spin Coater: RCD8 processing: Difference between revisions
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==Automatic dispense== | ==Automatic dispense== | ||
*'''1 TMPLT aut disp SU8''' | *'''1 TMPLT aut disp SU8''' | ||
Dispense; SU-8 string breaking; spread step; | Dispense; SU-8 string breaking; spread step; spin-off; deceleration. | ||
*'''1 TMPLT aut disp SU8 Gyrset''' | *'''1 TMPLT aut disp SU8 Gyrset''' | ||
Dispense; SU-8 string breaking; Gyrset down; spread step; | Dispense; SU-8 string breaking; Gyrset down; spread step; spin-off; deceleration; Gyrset up. | ||
*'''1 TMPLT aut disp''' | *'''1 TMPLT aut disp''' | ||
Dispense; | Dispense; spin-off; deceleration. | ||
*'''1 TMPLT aut disp spread''' | *'''1 TMPLT aut disp spread''' | ||
Dispense; spread step; | Dispense; spread step; spin-off; deceleration. | ||
*'''1 TMPLT aut disp Gyrset''' | *'''1 TMPLT aut disp Gyrset''' | ||
Dispense; Gyrset down; | Dispense; Gyrset down; spin-off; deceleration; Gyrset up. | ||
*'''1 TMPLT aut disp Gyrset sprd''' | *'''1 TMPLT aut disp Gyrset sprd''' | ||
Dispense; Gyrset down; spread step; | Dispense; Gyrset down; spread step; spin-off; deceleration; Gyrset up. | ||