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Specific Process Knowledge/Lithography/Coaters/Spin Coater: RCD8 processing: Difference between revisions

Taran (talk | contribs)
Taran (talk | contribs)
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==Automatic dispense==
==Automatic dispense==
*'''1 TMPLT aut disp SU8'''
*'''1 TMPLT aut disp SU8'''
Dispense; SU-8 string breaking; spread step; acceleration to spin-off; deceleration.
Dispense; SU-8 string breaking; spread step; spin-off; deceleration.
*'''1 TMPLT aut disp SU8 Gyrset'''
*'''1 TMPLT aut disp SU8 Gyrset'''
Dispense; SU-8 string breaking; Gyrset down; spread step; acceleration to spin-off; deceleration; Gyrset up.
Dispense; SU-8 string breaking; Gyrset down; spread step; spin-off; deceleration; Gyrset up.
*'''1 TMPLT aut disp'''
*'''1 TMPLT aut disp'''
Dispense; acceleration to spin-off; deceleration.
Dispense; spin-off; deceleration.
*'''1 TMPLT aut disp spread'''
*'''1 TMPLT aut disp spread'''
Dispense; spread step; acceleration to spin-off; deceleration.
Dispense; spread step; spin-off; deceleration.
*'''1 TMPLT aut disp Gyrset'''
*'''1 TMPLT aut disp Gyrset'''
Dispense; Gyrset down; acceleration to spin-off; deceleration; Gyrset up.
Dispense; Gyrset down; spin-off; deceleration; Gyrset up.
*'''1 TMPLT aut disp Gyrset sprd'''
*'''1 TMPLT aut disp Gyrset sprd'''
Dispense; Gyrset down; spread step; acceleration to spin-off; deceleration; Gyrset up.
Dispense; Gyrset down; spread step; spin-off; deceleration; Gyrset up.