Specific Process Knowledge/Lithography/Coaters/Spin Coater: RCD8 processing: Difference between revisions
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==Manual dispense== | ==Manual dispense== | ||
*'''1 TMPLT man disp''' | *'''1 TMPLT man disp''' | ||
Spin-off; deceleration. | |||
*'''1 TMPLT man disp spread''' | *'''1 TMPLT man disp spread''' | ||
Spread step; | Spread step; spin-off; deceleration. | ||
*'''1 TMPLT man disp Gyrset''' | *'''1 TMPLT man disp Gyrset''' | ||
Gyrset down; | Gyrset down; spin-off; deceleration; Gyrset up. | ||
*'''1 TMPLT man disp Gyrset sprd''' | *'''1 TMPLT man disp Gyrset sprd''' | ||
Gyrset down; spread step; | Gyrset down; spread step; spin-off; deceleration; Gyrset up. | ||
==Automatic dispense== | ==Automatic dispense== | ||