Specific Process Knowledge/Lithography/Coaters/Spin Coater: RCD8 processing: Difference between revisions
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==Manual dispense== | ==Manual dispense== | ||
*1 TMPLT man disp | *1 TMPLT man disp | ||
Acceleration to spin-off; deceleration. | |||
*1 TMPLT man disp spread | *1 TMPLT man disp spread | ||
Spread step; acceleration to spin-off; deceleration. | |||
*1 TMPLT man disp Gyrset | *1 TMPLT man disp Gyrset | ||
Gyrset down; acceleration to spin-off; deceleration; Gyrset up. | |||
*1 TMPLT man disp Gyrset sprd | *1 TMPLT man disp Gyrset sprd | ||
Gyrset down; spread step; acceleration to spin-off; deceleration; Gyrset up. | |||
==Automatic dispense== | ==Automatic dispense== | ||