Specific Process Knowledge/Lithography/Coaters/Spin Coater: RCD8 processing: Difference between revisions
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==Automatic dispense== | ==Automatic dispense== | ||
*1 TMPLT aut SU8 | *1 TMPLT aut disp SU8 | ||
*1 TMPLT aut SU8 | *1 TMPLT aut disp SU8 Gyrset | ||
*1 TMPLT aut disp | *1 TMPLT aut disp | ||
*1 TMPLT aut disp spread | *1 TMPLT aut disp spread | ||
*1 TMPLT aut disp Gyrset | *1 TMPLT aut disp Gyrset | ||
*1 TMPLT aut disp Gyrset sprd | *1 TMPLT aut disp Gyrset sprd | ||