Specific Process Knowledge/Lithography/Coaters: Difference between revisions

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VisualWikitext

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 !colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment
 |style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/Coaters#SSE Spinner|SSE Spinner]]</b>
-|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/Coaters#KS Spinner|KS Spinner]]</b>
+|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/Coaters#Coaters#Spin_Coater:_RCD8|Spin Coater: RCD8]]</b>
 |style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/Coaters#Spin Track 1 + 2|Spin Track 1 + 2]]</b>
 |style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spinner_.28Polymers.29|Manual Spinner (Polymers)]]</b>
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 **E-beam resist
 |style="background:WhiteSmoke; color:black"|
-*Coating and baking of
+*Coating of
-**AZ5214E resist
+**SU-8 resist
-**AZ4562 resist
+**AZ 5214E resist
-**SU8 resist
+**AZ 4562 resist
+**AZ MiR resist
+**AZ nLOF resist
 |style="background:WhiteSmoke; color:black"|
 *In-line substrate HMDS priming
@@ Line 70: / Line 72: @@
 * Acetone for drip pan
 |style="background:WhiteSmoke; color:black"|
-* AZ5214E resist
+* No permanent media
-* PGMEA for edge bead removal
-* Acetone for chuck cleaning
 |style="background:WhiteSmoke; color:black"|
 * AZ MiR 701 (29cps) resist
@@ Line 100: / Line 100: @@
 *100 - 5000 rpm
 |style="background:WhiteSmoke; color:black"|
-*100-5000 rpm
+*10 - 5000 rpm (3000 rpm with Gyrset)
 |style="background:WhiteSmoke; color:black"|
 *10 - 9990 rpm