Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange: Difference between revisions
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! Name/Type | ! Name/Type | ||
! Description | ! Description/parameters | ||
! Wafer ID | ! Wafer ID | ||
! Comment | ! Comment | ||
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| width="100"| 1 minute, 10 degrees, 10 mTorr, 80 SF<sub>6</sub>, 150 W coil, 3 W platen | | width="100"| 1 minute, 10 degrees, 10 mTorr, 80 SF<sub>6</sub>, 150 W coil, 3 W platen | ||
| S003900 | | S003900 | ||
| 4" wafer | | 4" wafer, 50 % load | ||
| | | | ||
[[file:S003900-01.jpg |120px|frameless ]] | [[file:S003900-01.jpg |120px|frameless ]] | ||
| Line 45: | Line 45: | ||
| S00XXX | | S00XXX | ||
| | | No test yet | ||
| [[file:S00XX centre.jpg |250px|frameless ]] | | [[file:S00XX centre.jpg |250px|frameless ]] | ||
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