Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange: Difference between revisions
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! rowspan="2" width="100"| Continuous black silicon recipe on blank wafer | ! rowspan="2" width="100"| Continuous black silicon recipe on blank wafer | ||
| rowspan="2" width="100"| 15 mins, -10 degrees, 32 mtorr, 60 sccm SF<sub>6</sub>, 55 sccm O<sub>2</sub>, 70 W platen | | rowspan="2" width="100"| 15 mins, -10 degrees, 32 mtorr, 60 sccm SF<sub>6</sub>, 55 sccm O<sub>2</sub>, 70 W platen | ||
| | | S004592 | ||
| Wafer centre | | Wafer centre | ||
| | | [[file:S004592 centre.jpg |250px|frameless ]] | ||
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| S004679 | | S004679 | ||
| Wafer centre | | Wafer centre | ||