Specific Process Knowledge/Etch/DRIE-Pegasus: Difference between revisions
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The showerhead that distributes the process gasses inside the plasma source has been changed. The new showerhead has larger holes that reduce the gas flow resistance. Flowing easier from the fast switching MFC's to the chamber, the gas will not mix up as easily. This enables us to run Bosch processes with shorter cycles times. Shorter cycles times means smaller scallops and hence lower roughness. | The showerhead that distributes the process gasses inside the plasma source has been changed. The new showerhead has larger holes that reduce the gas flow resistance. Flowing easier from the fast switching MFC's to the chamber, the gas will not mix up as easily. This enables us to run Bosch processes with shorter cycles times. Shorter cycles times means smaller scallops and hence lower roughness. | ||
We believe that only switched processes will be affected by this change. Continuous processes such as [[Specific Process Knowledge/Etch/DRIE-Pegasus/processC|Process C]], [[Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano142|Nano1.42]] | We believe that only switched processes will be affected by this change. Continuous processes such as [[Specific Process Knowledge/Etch/DRIE-Pegasus/processC|Process C]], [[Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano142|Nano1.42]] or the black silicon recipes are not believed to be noticeably affected. | ||
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== Additional information == | == Additional information == | ||