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| == Mask for UV exposure ==
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|
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| When you do UV exposure you need to have a mask. Here you can find information how to design and order your mask.
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|
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| === Tips and tricks for mask designing ===
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|
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| Find a guide for L-edit and mask design here:
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| * [[Media:Beginner guide to LEdit v1.4-1.pdf | Beginner guide to LEdit v1.4-1.pdf]]
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| * [[Media:Guide to mask making.pdf | Guide to mask making.pdf]]
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| Unfortunately they are quite old, but may be useful anyway. Note some links/e-mails etc. are not correct anymore
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|
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| ===Alignment marks===
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| Following alignment marks are suggested to use on the EVG620 automatic aligner for good pattern recognition. Pleased be adviced that they can be removed in KOH etching.
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| *[[Media:Alignmentkeys2.cif|Alignment marks 2 .cif]] - ''You need the program "Clewin" to open this file''
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| *[[Media:Alignmentkeys2.tdb|Alignment marks 2 .tdb]] - ''You need the program "L-Edit" to open this file''
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| ====External links====
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| *[http://www.wieweb.com Clewin download]
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| ====Alignment marks location====
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| * KS Aligner MA6
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| * Aligner 6inch EVG620
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| The mask's alignment marks for 4inch process:
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| BSA must be located between -1,0 and +1,0 mm in vertical location from mask center (y=0-+1mm) and exactly at 45mm in left and right in horizontal location (x=+-45mm).
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| TSA must be located 35-45 mm in left and right in horizontal location and between -2 and +2 mm in vertical location.
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| The mask's alignment marks for 6inch process:
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| Both BSA and TSA must be located between -2,5 and +2,5 mm in vertical location from mask center and 60 mm in left and right in horizontal location.
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| Please notice that if you plan to use the automatic alignment option the alignment marks must be displaced from y=0 to y=+/- 1,6mm.
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|
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| ===How to order a mask===
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| Our standard mask supplier is [http://deltamask.nl/ Delta Mask].
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| The smallest feature size obtainable from Delta Mask is 1.5 µm. If you need structures smaller than this please write it specificly in the e-mail. Be aware that this will increase the price by at least a factor of 3.
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|
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| Send your *.cif file or *.gds file (for 7" mask or masks with CD under 1.5µm only *.gds should be used) in an e-mail along with a text file describing your specs ([[mask_spec|example spec file]]). E-mail address can be found in [[Danchip_contact_information]]. Cost according to Danchip price list.
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|
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| ===Mask sets made by Danchip===
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| ==== Danchip quality control masks ====
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|
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| This section contains a description of some of the quality control designs.
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|
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| '''ASE standisation designs:'''
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| The quality control procedure on the ASE is using the daqmask 2 mask
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|
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| * [[file:Daqmask2.pdf | A description of the daqmask 2 mask]]
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| * [[file:Daqmask2-a.tdb | The L-Edit design file]]
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|
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|
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| '''RIE standisation design:'''
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| The quality control procedures on RIE2 is using the dASEfeRIE mask
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|
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| * [[file:daseferie.pdf | A description of the dASEfeRIE mask]]
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| * [[file:dASEfeRIE.tdb | The L-Edit design file]]
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|
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| ==== Masks for process development ====
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|
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| *[[/travka|Travka mask set (7 masks)]]
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