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Specific Process Knowledge/Doping: Difference between revisions

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===Ion implantation===
Ion implantation cannot be done at Danchip. IBS offers ion-beam implantation as a service.
See more at the homepage of IBS: http://www.ion-beam-services.com/about_us.htm
When wafers return from Ion implantation they need a clean before entering the cleanroom. Activation and redistribution of the dopants is required and is done by a high temperature anneal in the high temperature furnaces or by rapid thermal anneal.