Specific Process Knowledge/Characterization/AFM: Atomic Force Microscopy/Workspaces

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Roughness measurements High aspect ratio samples Steep steps - but no high aspect ratio Topographic measurement with no or very small steps (<?)

Comparison method 1 and method 2 for the process

	Roughness measurements	Topographic measurements with no steep steps	Steep steps but no high aspect ratio	High aspect ratio measurements
Recommended mode	Roughness measurement can be done in both Contact, Tapping and ScanAsyst mode. We recommend ScanAsyst because of less chance of (non-uniform) deformation of the sample and less tip wear - and because of ease of use.	For Topographic measurements with no steep steps we also recommend ScanAsyst mode due to less chance of (non-uniform) deformation of the sample and less tip wear - and because of ease of use.	For Steep steps but no high aspect ratio structures we still recommend ScanAsyst but it will go slower than Tapping mode.	For High aspect ratio measurements we recommend Tapping mode. There is not yet a ScanAsyst probe developed for high aspect ratio. Therefor we recommend tapping mode.
Recommended probes	A B	A B
Recommended experiment/Workspace	A B C	A
Substrate size	# small samples # 50 mm wafers # 100 mm wafers # 150 mm wafers	# small samples # 50 mm wafers # 100 mm wafers # 150 mm wafers
Allowed materials	Allowed material 1 Allowed material 2	Allowed material 1 Allowed material 2 Allowed material 3