Specific Process Knowledge/Doping: Difference between revisions
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![[Specific_Process_Knowledge/Thermal_Process/A4_Phosphor_Pre-dep_furnace| | ![[Specific_Process_Knowledge/Thermal_Process/A4_Phosphor_Pre-dep_furnace|Phosphorous predep]] | ||
![[Specific_Process_Knowledge/Thermal_Process/A1_Bor_Drive-in_furnace|Boron predep]] | ![[Specific_Process_Knowledge/Thermal_Process/A1_Bor_Drive-in_furnace|Boron predep]] | ||
![[Specific Process Knowledge/Thin_film_deposition/PECVD|PECVD doped thin film]] | ![[Specific Process Knowledge/Thin_film_deposition/PECVD|PECVD doped thin film]] | ||
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===Ion implantation=== | ===Ion implantation=== | ||
Ion | Ion implantation cannot be done at Danchip. IBS offers ion-beam implantation as a service. See more at: http://www.ion-beam-services.com/about_us.htm | ||