Specific Process Knowledge/Lithography/CSAR: Difference between revisions
| Line 374: | Line 374: | ||
'''30 nm''' | '''30 nm''' | ||
{| cellpadding="2" style="border: 1px solid darkgray;" class="wikitable" style="width: 90%;" | |||
! dose [muC/cm2] | |||
! 240 | |||
! 270 | |||
! 300 | |||
! ACHK | |||
|- | |||
| | |||
| [[File:6_13_30nm_240_shot14.tif|250px]] | |||
| [[File:53nmCSAR30nmOverviewBasedose.png|250px]] | |||
| [[File:53nmCSAR30nmOverviewBasedose+5%.png|250px]] | |||
| | |||
|- | |||
| | |||
| [[File:53nmCSAR30nmLinesBasedose-5%.png|250px]] | |||
| [[File:53nmCSAR30nmLinesBasedose.png|250px]] | |||
| [[File:53nmCSAR30nmLinesBasedose+5%.png|250px]] | |||
| [[File:30nmShot10.png|250px]] | |||
|} | |||