Specific Process Knowledge/Lithography/UVExposure: Difference between revisions
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===Process information=== | ===Process information=== | ||
The KS Aligner has an i-line notch filter installed. This results in an exposure light peak around 365nm with a FWHM of 7nm. Dependent on the spectral sensitivity of the resist, the optimal dose may be increased compared to broadband exposure on the Aligner-6inch. Unless otherwise stated, the exposure doses given here are for standard silicon wafers. | The KS Aligner has an i-line notch filter installed. This results in an exposure light peak around 365nm with a FWHM of 7nm. Dependent on the spectral sensitivity of the resist, the optimal dose may be increased compared to broadband exposure on the Aligner-6inch. Unless otherwise stated, the exposure doses given here are for standard silicon wafers. | ||
*[[Specific Process Knowledge/Lithography/UVExposure/UVExposure dose|Information on UV exposure dose]] | |||
'''Positive tone resists:''' | '''Positive tone resists:''' | ||