Specific Process Knowledge/Lithography/UVExposure: Difference between revisions
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This section contains a description of some of the quality control designs. | This section contains a description of some of the quality control designs. | ||
ASE standisation designs: | |||
The quality control procedure on the ASE is using the daqmask 2 mask | |||
*[[ | * [[file:Daqmask2.pdf | A description of the daqmask 2 mask]] | ||
* [[file:Daqmask2-a.tdb | The L-Edit design file]] | |||
RIE standisation design: | |||
The quality control procedures on RIE2 is using the dASEfeRIE mask | |||
* [[file:daseferie.pdf | A description of the dASEfeRIE mask]] | |||
* [[file:dASEfeRIE.tdb | The L-Edit design file]] | |||
==== Masks for process development ==== | ==== Masks for process development ==== | ||