Specific Process Knowledge/Lithography/UVExposure: Difference between revisions
Appearance
| Line 140: | Line 140: | ||
Send your *.cif file or *.gds file (for 7" mask or masks with CD under 1.5µm only *.gds should be used) in an e-mail along with a text file describing your specs ([[mask_spec|example spec file]]). E-mail address can be found in [[Danchip_contact_information]]. Cost according to Danchip price list. | Send your *.cif file or *.gds file (for 7" mask or masks with CD under 1.5µm only *.gds should be used) in an e-mail along with a text file describing your specs ([[mask_spec|example spec file]]). E-mail address can be found in [[Danchip_contact_information]]. Cost according to Danchip price list. | ||
===Mask sets made by Danchip=== | |||
==== Danchip quality control masks ==== | |||
This section contains a description of some of the quality control designs. | |||
*[[/daqmask2| ASE standisation design]] | |||
*[[/daseferie| RIE standisation design]] | |||
==== Masks for process development ==== | |||
*[[/travka|Travka mask set (7 masks)]] | |||
<br clear="all" /> | <br clear="all" /> | ||