Specific Process Knowledge/Lithography/UVExposure: Difference between revisions
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Unfortunately they are quite old, but may be useful anyway. Note some links/e-mails etc. are not correct anymore | Unfortunately they are quite old, but may be useful anyway. Note some links/e-mails etc. are not correct anymore | ||
==Alignment marks== | ===Alignment marks=== | ||
Following alignment marks are suggested to use on the EVG620 automatic aligner for good pattern recognition. Pleased be adviced that they can be removed in KOH etching. | Following alignment marks are suggested to use on the EVG620 automatic aligner for good pattern recognition. Pleased be adviced that they can be removed in KOH etching. | ||
*[[Media:Alignmentkeys2.cif|Alignment marks 2 .cif]] - ''You need the program "Clewin" to open this file'' | *[[Media:Alignmentkeys2.cif|Alignment marks 2 .cif]] - ''You need the program "Clewin" to open this file'' | ||