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| Line 66: |
Line 66: |
| *Flood exposure | | *Flood exposure |
| *Proximity exposure with home-made chuck and maskholder | | *Proximity exposure with home-made chuck and maskholder |
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| |-
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| !style="background:silver; color:black" align="center" valign="center" rowspan="2"|Process parameter range
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| |style="background:LightGrey; color:black"|Positive Process
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| |style="background:WhiteSmoke; color:black"|
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| *dose 42mW/cm2 for 1,5um AZ5214E resist
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| *dose 56mW/cm2 for 2,2um AZ5214E resist
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| |style="background:WhiteSmoke; color:black"|
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| *dose 23mW/cm2 for 1,5um AZ5214E resist
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| *dose 35mW/cm2 for 2,2um AZ5214E resist
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| |style="background:WhiteSmoke; color:black"|
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| *
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| |style="background:WhiteSmoke; color:black"|
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| *polymer dependant
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| |-
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| |style="background:LightGrey; color:black"|Negative Process
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| |style="background:WhiteSmoke; color:black"|
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| *dose 21mW/cm2 for 1,5um AZ5214E resist
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| *dose 28mW/cm2 for 2,2um AZ5214E resist
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| then 210mW/cm2 flood exposure after PEB
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| |style="background:WhiteSmoke; color:black"|
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| *dose 16mW/cm2 for 1,5um AZ5214E resist
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| *dose 18mW/cm2 for 2,2um AZ5214E resist
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| then 210mW/cm2 flood exposure after PEB
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| |style="background:WhiteSmoke; color:black"|
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| *
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| |style="background:WhiteSmoke; color:black"|
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| *polymer dependant
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| |- | | |- |
