Specific Process Knowledge/Lithography/Development: Difference between revisions
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*AZ 5214E | *AZ 5214E | ||
*AZ 4562 | *AZ 4562 | ||
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Development of | |||
*SU-8 | |||
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(NaOH and sodium borate salt) | (NaOH and sodium borate salt) | ||
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mr-Dev 600 | |||
(PGMEA) | |||
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!style="background:silver; color:black" align="center" valign="center" rowspan="1"|Method | !style="background:silver; color:black" align="center" valign="center" rowspan="1"|Method | ||
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Submersion | |||
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Submersion | Submersion | ||
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22°C | 22°C | ||
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Room temperature | |||
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|style="background:LightGrey; color:black"|Agitation | |style="background:LightGrey; color:black"|Agitation | ||
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Circulation and mechanical | Circulation and mechanical | ||
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Magnetic stirrer | |||
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|style="background:LightGrey; color:black"|Rinse | |style="background:LightGrey; color:black"|Rinse | ||
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DI water | DI water | ||
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IPA | |||
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* 100 mm wafers | * 100 mm wafers | ||
* 150 mm wafers | * 150 mm wafers | ||
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* 100 mm wafers | |||
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| style="background:LightGrey; color:black"|Allowed materials | | style="background:LightGrey; color:black"|Allowed materials | ||
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Film or pattern of all types | Film or pattern of all types | ||
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Silicon and glass substrates | |||
Film or pattern of all but Type IV | |||
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|style="background:LightGrey; color:black"|Batch | |style="background:LightGrey; color:black"|Batch | ||
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1-8 | 1-8 | ||
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1-25 | 1-25 | ||
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1-6 | |||
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