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| !style="background:silver; width:100px; color:black;" align="center"|Purpose | | !style="background:silver; color:black;" align="center" width="60"|Purpose |
| |style="background:LightGrey; color:black"| | | |style="background:LightGrey; color:black"| |
| |style="background:WhiteSmoke; color:black"| | | |style="background:WhiteSmoke; color:black"| |
| *Coating and baking of
| | Development of |
| **AZ5214E resist | | *AZ 5214E |
| **AZ4562 resist
| | *AZ 4562 |
| **E-beam resist | |
| |style="background:WhiteSmoke; color:black"| | | |style="background:WhiteSmoke; color:black"| |
| *Coating and baking of
| | Development of |
| **AZ5214E resist | | *AZ 5214E |
| **AZ4562 resist
| | *AZ 4562 |
| **SU8 resist | |
| |style="background:WhiteSmoke; color:black"| | | |style="background:WhiteSmoke; color:black"| |
| *Coating and baking of
| | Development of |
| **SU8 resist | | *AZ 5214E |
| | *AZ 4562 |
| |style="background:WhiteSmoke; color:black"| | | |style="background:WhiteSmoke; color:black"| |
| *In-line substrate HMDS priming | | Development of |
| *Coating and baking of | | *AZ 5214E |
| **AZ MiR 701 (29cps) resist
| | *AZ 4562 |
| **AZ nLOF 2020 resist
| | |style="background:WhiteSmoke; color:black"| |
| *Post-exposure baking at 110°C
| | Development of |
| | *AZ 5214E |
| | *AZ 4562 |
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| |
|
| |- | | |- |
| !style="background:silver; color:black" align="center" valign="center" rowspan="3"|Performance | | !style="background:silver; color:black;" align="center" width="60"|Developer |
| |style="background:LightGrey; color:black"|Substrate handling | | |style="background:LightGrey; color:black"| |
| |style="background:WhiteSmoke; color:black"| | | |style="background:WhiteSmoke; color:black" align="center"| |
| * Cassette-to-cassette
| | AZ 351B diluted 1:5 in water |
| * Edge handling chuck
| | |
| |style="background:WhiteSmoke; color:black"|
| | (NaOH and sodium borate salt) |
| * Single substrate
| |
| * Non-vacuum chuck for fragile substrates
| |
| |style="background:WhiteSmoke; color:black"|
| |
| * Cassette-to-cassette
| |
| |-
| |
| |style="background:LightGrey; color:black"|Permanent media
| |
| |style="background:WhiteSmoke; color:black"|
| |
| * AZ5214E resist
| |
| * AZ4562 resist
| |
| * Acetone for chuck cleaning
| |
| * Acetone for drip pan
| |
| |style="background:WhiteSmoke; color:black"|
| |
| * AZ5214E resist
| |
| * PGMEA for edge bead removal
| |
| * Acetone for chuck cleaning
| |
| |style="background:WhiteSmoke; color:black"|
| |
| * AZ MiR 701 (29cps) resist
| |
| * AZ nLOF 2020 resist
| |
| * PGMEA for backside rinse and edge-bead removal
| |
| * PGMEA for spinner bowl cleaning and vapor tip bath
| |
| |-
| |
| |style="background:LightGrey; color:black"|Manual dispense option
| |
| |style="background:WhiteSmoke; color:black"|
| |
| * 2 automatic syringes
| |
| |style="background:WhiteSmoke; color:black"|
| |
| * yes
| |
| * pneumatic dispense for SU8 resist
| |
| |style="background:WhiteSmoke; color:black"|
| |
| * no
| |
|
| |
|
| |-
| |
| !style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates
| |
| |style="background:LightGrey; color:black"|Substrate size
| |
| |style="background:WhiteSmoke; color:black"|
| |
| *50 mm wafers
| |
| *100 mm wafers
| |
| *150 mm wafers
| |
| |style="background:WhiteSmoke; color:black"|
| |
| *100 mm wafer
| |
| *150 mm wafer
| |
| |style="background:WhiteSmoke; color:black"|
| |
| *100 mm wafers
| |
| *150 mm wafers (tool change required)
| |
| |-
| |
| |style="background:LightGrey; color:black"|Batch size
| |
| |style="background:WhiteSmoke; color:black"|
| |
| *1-24
| |
| |style="background:WhiteSmoke; color:black"|
| |
| *1
| |
| |style="background:WhiteSmoke; color:black"|
| |
| *1-25
| |
| |-
| |
| | style="background:LightGrey; color:black"|Allowed materials
| |
| |style="background:WhiteSmoke; color:black"|
| |
| *All cleanroom materials except III-V materials
| |
| |style="background:WhiteSmoke; color:black"|
| |
| *All cleanroom materials except III-V materials
| |
| |style="background:WhiteSmoke; color:black"|
| |
| *Silicon
| |
| *Glass
| |
| |-
| |
| |} | | |} |
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| <br clear="all" /> | | <br clear="all" /> |
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