Specific Process Knowledge/Lithography/UVExposure: Difference between revisions
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Compared to exposure on Aligner-6inch, the dose on KS-Aligner is doubled. | Compared to exposure on Aligner-6inch, the dose on KS-Aligner is doubled. | ||
*1.5µm: 21 mJ/cm<sup>2</sup> corresponding to 3 seconds exposure at 7 mW/cm<sup>2</sup>. | *1.5µm: 21 mJ/cm<sup>2</sup> corresponding to 3 seconds exposure at 7 mW/cm<sup>2</sup>. | ||
*1.5µm resist on boron glass: around 7 sec (49 mJ/cm<sup>2</sup>) (supplied March 2013 by Morten Bo Lindholm Mikkelsen, DTU Nanotech). | |||
*2.2µm: 24 mJ/cm<sup>2</sup> corresponding to 3.4 seconds exposure at 7 mW/cm<sup>2</sup>. | *2.2µm: 24 mJ/cm<sup>2</sup> corresponding to 3.4 seconds exposure at 7 mW/cm<sup>2</sup>. | ||