Specific Process Knowledge/Lithography/Development: Difference between revisions
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*10µm resist: 5 min | *10µm resist: 5 min | ||
'''Standard development procedure''' | '''Standard development procedure:''' | ||
*Before using one of developer baths, please check the "Litho4_Dev-7up-KOH" logbook to find out when they were last used. A fresh bath can be reused without problems. | *Before using one of developer baths, please check the "Litho4_Dev-7up-KOH" logbook to find out when they were last used. A fresh bath can be reused without problems. | ||