Specific Process Knowledge/Lithography/UVExposure: Difference between revisions
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*1.5µm: 21 mJ/cm<sup>2</sup> corresponding to 3 seconds exposure at 7 mW/cm<sup>2</sup>. | *1.5µm: 21 mJ/cm<sup>2</sup> corresponding to 3 seconds exposure at 7 mW/cm<sup>2</sup>. | ||
*2.2µm: 24 mJ/cm<sup>2</sup> corresponding to 3.4 seconds exposure at 7 mW/cm<sup>2</sup>. | *2.2µm: 24 mJ/cm<sup>2</sup> corresponding to 3.4 seconds exposure at 7 mW/cm<sup>2</sup>. | ||
Flood exposure after reversal bake: 210 mJ/cm<sup>2</sup> corresponding to 30 seconds exposure at 7 mW/cm<sup>2</sup>. | |||
'''AZ nLOF 20XX''' ''Preliminary results'' | '''AZ nLOF 20XX''' ''Preliminary results'' | ||