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Specific Process Knowledge/Lithography/UVExposure: Difference between revisions

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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,518 edits
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,518 edits
Line 41: Line 41:
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*350W Hg-lamp
*350W Hg-lamp
*i-line filter (365 nm notch filter), intensity in Constant Intensity mode: 7mW/cm2 @ 365 nm
*i-line filter (365nm notch filter), intensity in Constant Intensity mode: 7mW/cm<sup>2</sup> @ 365nm
*303 nm filter optional  
*303nm filter optional  
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*350W Hg-lamp
*350W Hg-lamp
*SU8 filter (long-pass), intensity in Constant Power mode: 7mW/cm2 @ 365 nm
*SU8 filter (long-pass), intensity in Constant Power mode: 7mW/cm<sup>2</sup> @ 365nm
*i-line filter optional
*i-line filter optional


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