Specific Process Knowledge/Lithography/UVExposure: Difference between revisions
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*2.2µm: 56-70 mJ/cm<sup>2</sup> corresponding to 8-10 seconds exposure at 7 mW/cm<sup>2</sup>. | *2.2µm: 56-70 mJ/cm<sup>2</sup> corresponding to 8-10 seconds exposure at 7 mW/cm<sup>2</sup>. | ||
*4.2µm: ~140 mJ/cm<sup>2</sup> corresponding to ~20 seconds exposure at 7 mW/cm<sup>2</sup>. | *4.2µm: ~140 mJ/cm<sup>2</sup> corresponding to ~20 seconds exposure at 7 mW/cm<sup>2</sup>. | ||
*10µm: ~280 mJ/cm<sup>2</sup> corresponding to ~40 seconds exposure at 7 mW/cm<sup>2</sup>. | *10µm: ~280 mJ/cm<sup>2</sup> corresponding to ~40 seconds exposure at 7 mW/cm<sup>2</sup>. Multiple exposure with 10s pauses is recommended. | ||
'''AZ MiR 701''' ''Preliminary results'' | '''AZ MiR 701''' ''Preliminary results'' | ||
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Compared to exposure on Aligner-6inch, the dose on KS-Aligner is doubled. | Compared to exposure on Aligner-6inch, the dose on KS-Aligner is doubled. | ||
*1.5µm: 21 mJ/cm<sup>2</sup> corresponding to 3 seconds exposure at 7 mW/cm<sup>2</sup>. | *1.5µm: 21 mJ/cm<sup>2</sup> corresponding to 3 seconds exposure at 7 mW/cm<sup>2</sup>. | ||
*2.2µm: 24 mJ/cm<sup>2</sup> corresponding to | *2.2µm: 24 mJ/cm<sup>2</sup> corresponding to 3.4 seconds exposure at 7 mW/cm<sup>2</sup>. | ||
'''AZ nLOF 20XX''' ''Preliminary results'' | '''AZ nLOF 20XX''' ''Preliminary results'' | ||