Specific Process Knowledge/Lithography/UVExposure: Difference between revisions

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 ===Process information===
-====Positive tone resists====
+'''Positive tone resists:'''
 '''AZ 5214E and AZ 4562'''
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 *1.5µm: 157.5 mJ/cm<sup>2</sup> corresponding to 22.5 seconds exposure at 7 mW/cm<sup>2</sup>.
-====Negative tone resists====
+'''Negative tone resists'''
 '''AZ 5214E image reversal'''
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 *2.2µm: 24 mJ/cm<sup>2</sup> corresponding to 1.7 seconds exposure at 7 mW/cm<sup>2</sup>.
-'''AZ nLOF 20XX'''
+'''AZ nLOF 20XX''' Preliminary results
 Compared to exposure on Aligner-6inch, the dose on KS-Aligner is the same.
-*1.5µm: 35-49 mJ/cm<sup>2</sup> corresponding to 5-7 seconds exposure at 7 mW/cm<sup>2</sup>.
+*1.5µm: 42 mJ/cm<sup>2</sup> corresponding to 6 seconds exposure at 7 mW/cm<sup>2</sup>.
+*2µm: 49 mJ/cm<sup>2</sup> corresponding to 7 seconds exposure at 7 mW/cm<sup>2</sup>.
+*3µm: 56 mJ/cm<sup>2</sup> corresponding to 8 seconds exposure at 7 mW/cm<sup>2</sup>.
+*4.3µm: 70 mJ/cm<sup>2</sup> corresponding to 10 seconds exposure at 7 mW/cm<sup>2</sup>.
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