Specific Process Knowledge/Lithography/UVExposure: Difference between revisions
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===Process information=== | ===Process information=== | ||
====Positive tone resists==== | |||
'''AZ 5214E and AZ 4562''' | '''AZ 5214E and AZ 4562''' | ||
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*1.5µm: 157.5 mJ/cm<sup>2</sup> corresponding to 22.5 seconds exposure at 7 mW/cm<sup>2</sup>. | *1.5µm: 157.5 mJ/cm<sup>2</sup> corresponding to 22.5 seconds exposure at 7 mW/cm<sup>2</sup>. | ||
====Negative tone resists==== | |||
'''AZ 5214E image reversal''' | '''AZ 5214E image reversal''' | ||