Specific Process Knowledge/Lithography/UVExposure: Difference between revisions
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*10µm: ~280 mJ/cm<sup>2</sup> corresponding to ~40 seconds exposure at 7 mW/cm<sup>2</sup>. | *10µm: ~280 mJ/cm<sup>2</sup> corresponding to ~40 seconds exposure at 7 mW/cm<sup>2</sup>. | ||
'''AZ MiR 701''' | '''AZ MiR 701''' Preliminary results | ||
Compared to exposure on Aligner-6inch, the dose on KS-Aligner is five-doubled. | |||
*1.5µm: 157.5 mJ/cm<sup>2</sup> corresponding to 22.5 seconds exposure at 7 mW/cm<sup>2</sup>. | |||
'''Negative tone resists:''' | '''Negative tone resists:''' | ||
'''AZ 5214E image reversal''' | '''AZ 5214E image reversal''' | ||
Compared to exposure on Aligner-6inch, the dose on KS-Aligner is doubled. | |||
*1.5µm: 21 mJ/cm<sup>2</sup> corresponding to 3 seconds exposure at 7 mW/cm<sup>2</sup>. | |||
*2.2µm: 24 mJ/cm<sup>2</sup> corresponding to 1.7 seconds exposure at 7 mW/cm<sup>2</sup>. | |||
'''AZ nLOF 20XX''' | '''AZ nLOF 20XX''' | ||
Compared to exposure on Aligner-6inch, the dose on KS-Aligner is the same. | |||
*1.5µm: 35-49 mJ/cm<sup>2</sup> corresponding to 5-7 seconds exposure at 7 mW/cm<sup>2</sup>. | |||
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