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Specific Process Knowledge/Lithography/UVExposure: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,528 edits
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'''AZ 5214E and AZ 4562'''
'''AZ 5214E and AZ 4562'''
*1.5µm: 35-49 mJ/cm_<sub>2<sub> corresponding to 5-7 seconds exposure at 7 mW/cm2.
*1.5µm: 35-49 mJ/cm<sup>2<sup> corresponding to 5-7 seconds exposure at 7 mW/cm2.


'''AZ MiR 701'''
'''AZ MiR 701'''
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